Proper Scaling of the Anomalous Hall Effect

Abstract

Working with epitaxial films of Fe, we succeeded in independent control of different scattering processes in the anomalous Hall effect. The result clearly exposed the fundamental flaws of the conventional scaling rhoAH=f(rho(xx)) between the anomalous Hall resistivity and longitudinal resistivity. A new scaling rhoAH=f(rho(xx0),rho(xx)) that also involves the residual resistivity has been established which helps identify the intrinsic and extrinsic mechanisms of the anomalous Hall effect.