Thickness variation of breakdown field strength in plasma oxidized aluminum films

Abstract

The breakdown field strength in plasma oxidized Al <inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</inf> O <inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">3</inf> films ranging in thickness from 15 to 600 Å, was observed to exhibit a dependence proportional to s <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">-1/4</sup> , where s is oxide thickness. This variation was found to be temperature independent.