Determination of interlayer composition at buried interfaces using soft x-ray resonant reflectivity

Abstract

The authors report determination of interlayer composition with subnanometer sensitivity at the buried interfaces using soft x-ray resonant reflectivity technique. Near the absorption edge, fine structure features of energy-dependent atomic scattering factor are sensitive to the composition, and can be exploited for determination of composition at the buried interfaces. This technique is demonstrated for a Mo–Si multilayer system using soft x-ray resonant reflectivity measurement.