High-k dielectric oxides obtained by PLD as solution for gates dielectric in MOS devices - Concepedia

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High-k dielectric oxides obtained by PLD as solution for gates dielectric in MOS devices

39

Citations

11

References

2007

Year

M. Filipescu, N. Scarisoreanu, V. Crăciun, B. Mitu, A. Purice, A. Moldovan, Valentin Ion, Ovidiu Toma, M. Dinescu

Applied Surface Science

Materials ScienceHigh-k Dielectric OxidesElectrical EngineeringMos DevicesEngineeringSemiconductor DeviceNanoelectronicsOxide ElectronicsApplied PhysicsTime-dependent Dielectric BreakdownSemiconductor MaterialMicroelectronicsElectrical Insulation

References

	Year	Citations

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