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Well-to-well non-uniformity in InGaN/GaN multiple quantum wells characterized by capacitance-voltage measurement with additional laser illumination
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Citations
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References
2012
Year
Wide-bandgap SemiconductorPhotonicsElectrical EngineeringCapacitance-voltage MeasurementIngan/gan Multiple QuantumEngineeringPhysicsNanoelectronicsQuantum DeviceApplied PhysicsQuantum WellsAluminum Gallium NitrideGan Power DeviceAdditional Laser IlluminationCategoryiii-v SemiconductorOptoelectronicsWell-to-well Non-uniformity
We experimentally investigated well-to-well non-uniformity in InGaN/GaN multiple quantum well (MQW) structures by using capacitance-voltage measurements with additional laser illumination. By varying the illuminating power of the resonant excitation, well-to-well non-uniformity through the MQWs was clearly revealed. The quantum wells (QWs) close to the n-GaN side show higher carrier accumulations and larger position shift as the excitation power is increased, relative to the p-side QWs. Both results were attributed to the existence of stronger piezoelectric fields in the n-side QWs induced by subsequent partial relaxation of strain through the MQWs.
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