Publication | Closed Access
Influence of RF power and fluorine doping on the properties of sputtered ITO thin films
17
Citations
29
References
2008
Year
Electrical EngineeringFluorine DopingEngineeringPhysicsNanoelectronicsOxide ElectronicsSurface ScienceApplied PhysicsRf PowerSemiconductor MaterialThin FilmsMicroelectronicsThin Film Processing
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