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Morphology of metal phthalocyanine thin films
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1988
Year
Materials ScienceMaterials EngineeringMaterial AnalysisEngineeringElectronic MaterialsSurface ScienceApplied PhysicsNickel PhthalocyanineSubstrate SurfaceThin Film Process TechnologyChemistryThin FilmsChemical DepositionChemical Vapor DepositionThin Film Processing
Thin films of nickel phthalocyanine and copper phthalocyanine were deposited on substrates heated to 160 °C. These films were characterized by transmission electron microscopy, electron diffraction, and thickness and density measurements. The films were 1000–1500 Å thick and contained α phase crystallites with the stacking axis parallel to the substrate surface. Implications for electrical properties of the films are discussed.