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Stability of the quasicubic phase in the initial stage of the growth of bismuth films on Si(111)-7×7
40
Citations
14
References
2006
Year
EngineeringBismuth-based SuperconductorsCrystal Growth TechnologyQuasicubic PhaseSemiconductorsTunneling MicroscopyQuantum MaterialsEpitaxial GrowthBismuth FilmsMaterials ScienceInitial StageBismuth DepositionCrystalline DefectsPhysicsSemiconductor MaterialLayered MaterialSurface ScienceApplied PhysicsCondensed Matter PhysicsThin FilmsLayered BiTopological Heterostructures
We discuss the results of the scanning tunneling microscopy (STM) investigations and ab initio calculations of the structure and stability of the quasicubic Bi{012} film formed in the initial stage of the bismuth deposition on the Si(111)-7×7 surface at room temperature. Results of our STM experiments show that paired-layer Bi{012} film grows on top of the initially formed wetting layer, with the Si 7×7 lattice preserved underneath. The pairing of the layers in the {012} film leads to the substantial stabilization of the film when it consists of an even number of layers and only even-number layered Bi{012} islands are observed to be stable. The buckling of the atoms in the topmost paired layer induced by the relaxation of the film is evidenced by the high-resolution STM images.
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