ALD deposited ZrO2 ultrathin layers on Si and Ge substrates: A multiple technique characterization - Concepedia

Concepedia

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ALD deposited ZrO2 ultrathin layers on Si and Ge substrates: A multiple technique characterization

23

Citations

30

References

2013

Year

Martha A. Botzakaki, N. Xanthopoulos, Eleni Makarona, C. Tsamis, S. Ladas, S. N. Georga, C. A. Krontiras

Microelectronic Engineering

Materials ScienceMaterials EngineeringIi-vi SemiconductorEpitaxial GrowthEngineeringNanoelectronicsSurface ScienceApplied PhysicsMultilayer HeterostructuresMultiple Technique CharacterizationChemical Vapor DepositionThin FilmsZro2 Ultrathin LayersMolecular Beam EpitaxyGe Substrates

References

	Year	Citations

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