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Influence of sputtering parameters on structures and residual stress of AlN films deposited by DC reactive magnetron sputtering at room temperature

Materials ScienceMaterials EngineeringAln FilmsAluminium NitrideEngineeringDc Reactive MagnetronMechanical EngineeringApplied PhysicsSurface ScienceResidual StressThin Film ProcessingMicrostructure