Publication | Closed Access
Studies of ultra shallow n+–p junctions formed by low-energy As-implantation
10
Citations
8
References
2004
Year
Semiconductor TechnologyEngineeringTunneling MicroscopyPhysicsApplied PhysicsSemiconductor MaterialSemiconductor Device FabricationMicroelectronicsLow-energy As-implantationSemiconductor Device
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