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Piezoelectric characteristic of nanocrystalline AlN films obtained by pulsed laser deposition at room temperature
15
Citations
24
References
2010
Year
Aluminium NitridePiezoelectric CharacteristicEngineeringAcoustic MetamaterialPiezoelectric PropertiesAluminum NitrideNanocrystalline Aln FilmsPiezoelectric MaterialPulsed Laser DepositionMaterials ScienceNanotechnologyPiezoelectricityLaser-assisted DepositionUltrasoundRoom TemperatureNanomaterialsApplied PhysicsThin FilmsMicromachined Ultrasonic Transducer
Aluminum nitride (AlN) thin films were deposited at room temperature by pulsed laser deposition, and their nanostructure and piezoelectric properties were investigated as a function of fluence. For all fluences, the films were found to consist of an amorphous AlN matrix containing crystalline AlN nanoparticles with size of 6–7 nm. These nanoparticles spark off the good piezoelectric response, with d33 piezoelectric coefficients between 2.3 and 3.8 pm V−1, similar to those obtained for (002)-oriented AlN films deposited at higher temperatures. These results indicate that nanocrystalline AlN films deposited at room temperature are good candidates for integration in acoustic wave applications.
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