Publication | Closed Access

Properties of fluorine-doped tin oxide films produced by atmospheric pressure chemical vapor deposition from tetramethyltin, bromotrifluoromethane and oxygen

Materials ScienceMaterials EngineeringChemical EngineeringEngineeringFluorine-doped TinOxide ElectronicsSurface ScienceChemistryThin FilmsChemical DepositionChemical Vapor DepositionThin Film Processing