Applied Physics Letters · 1999 · 105 citations · 16 references
Natural SciencesMaterials SciencePhysicsElectronic MaterialsMaterials PhysicsThin FilmsAmorphous MaterialsAmorphous SolidsLight-emitting DiodesLuminescent MaterialsRare-earth-doped MaterialsThin-film MaterialsAmorphous StructureBand GapDoping In Thin FilmsLight-emitting DevicesLight-emitting MaterialsOptical Band GapOptical TransmissionX-ray Diffraction Analysis
In this report, we demonstrate the observation of visible cathodoluminescence (CL) of Er-doped amorphous AlN films produced by sputtering. Optical transmission studies point out that the films are highly transparent and the band gap is about 5.61 eV. Elemental analysis by Rutherford backscattering spectrometry shows that AlN films are stoichiometric. X-ray diffraction measurements reveal that the films retain the amorphous structure even after annealing in N2 ambient at 1000 °C. The sharp characteristic emission lines in the CL spectra correspond to Er3+ intra-4fn shell transitions and are observed over the temperature range of 9–330 K. The results indicate the suitability of Er-doped amorphous AlN films for light-emitting device applications.
16
1.54-μm photoluminescence from Er-implanted GaN and AlN
R. G. Wilson, Robert N. Schwartz, C. R. Abernathy et al. · Applied Physics Letters · 1994 · 200 citations
Natural Sciences, Materials Engineering, Materials Science +17