Publication | Closed Access
Dielectric properties of RF plasma-deposited a-C:H and a-C:H:N films
10
Citations
7
References
2000
Year
Dielectric PropertiesEngineeringApplied PhysicsThin FilmsGas Discharge PlasmaPlasma ProcessingElectrical Insulation
| Year | Citations | |
|---|---|---|
Page 1
Page 1