Publication | Closed Access
A Small Microwave Plasma Source for Long Column Production without Magnetic Field
186
Citations
11
References
1975
Year
Mhz HfElectrical EngineeringEngineeringPhysicsLong Column ProductionApplied PhysicsApplied Plasma PhysicPlasma ScienceMagnetohydrodynamicsPlasma PhysicsMagnetic ConfinementNew Hf DeviceHf PowerInstrumentationMicroelectronicsMagnetic FieldPlasma Application
A new HF device is described. It allows the production, without the use of a magnetic field, of long plasma columns from a small HF coupling structure situated at one end of the column. Its operation is based on the propagation of a cold plasma surface wave. This device can work (in argon for example) at pressures from 2 mTorr to 20 Torr with electron densities from 1010 cm-3 to 1013 cm-3, depending on plasma diameter and HF power. Typically, 80W of 500 MHz HF will produce a 25 mn diameter column of 1.8 m length. The plasma is quiescent (low electron density fluctuations), efficient (~ 100% absorbed power), and perfectly reproducible. It can be used as a substitute for a positive column, and some practical applications are foreseen in ion production, laser excitation, gas preionization and spectroscopic sources.
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