Publication | Closed Access
Growth of highly oriented tin oxide thin films by laser evaporation deposition
46
Citations
15
References
1990
Year
Materials ScienceTin OxideOptical MaterialsLaser Evaporation DepositionEngineeringOxide ElectronicsSurface ScienceApplied PhysicsLaser EvaporationThin Film DevicesTransparent Thin FilmsThin FilmsPulsed Laser DepositionLaser-assisted DepositionThin Film Process TechnologyChemical Vapor DepositionThin Film Processing
Conducting and transparent thin films of tin oxide were prepared by the laser evaporation of an undoped powder-pressed polycrystalline tin oxide target onto unheated substrates. After characterizing these films, the results reveal that the films are highly oriented and with a grain size ∼0.2 μm. The nearly stoichiometric deposition of tin oxide films with deposition rates exceeding 24 Å per pulse was obtained by this method. The lowest resistivity obtained is 3.0×10−3 Ω cm. The visible transmittance (between 4000 and 7000 Å) is above 75%.
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