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Relative stability of low-index V<sub>2</sub>O<sub>5</sub>surfaces: a density functional investigation
47
Citations
32
References
2009
Year
EngineeringElectronic PropertiesChemistryElectronic StructureRelative StabilityMaterials ScienceNatural Cleavage PlanePhysicsSurface EnergyPhysical ChemistryQuantum ChemistryAb-initio MethodSurface CharacterizationTransition Metal ChalcogenidesNatural SciencesSurface AnalysisSurface ScienceApplied PhysicsCondensed Matter PhysicsInterfacial PhenomenaBulk OxideSurface Reactivity
Ab initio density functional calculations of the structural and electronic properties of V(2)O(5) bulk and its low-index surfaces are presented. For the bulk oxide and the (010) surface (the natural cleavage plane) a good agreement with experiment and with earlier ab initio calculations is found. For the first time, the investigations are extended to other low-index surfaces: (001) and (100). On both surfaces, termination conserving a bulk-like stoichiometry is preferred, but-in contrast to the (010) surface-a strong structural relaxation takes place. Relaxation reduces the surface energy from 1.16 to 0.48 J m(-2) for the (001) and from 0.61 to 0.55 J m(-2) for the (100) surface. Although the relaxed surface energies are still one order of magnitude higher than calculated for the (010) surface (0.047 J m(-2)), the Wulff construction demonstrates that (001) and (100) surfaces contribute about 15% of the total surface area of a V(2)O(5) crystallite, indicating a non-negligible role in the catalytic activity of V(2)O(5).
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