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Growth of TiO2 thin films on Si(1 0 0) and Si(1 1 1) substrates using single molecular precursor by high-vacuum MOCVD and comparison of growth behavior and structural properties

Materials ScienceMaterials EngineeringEngineeringNanoelectronicsNanotechnologySurface ScienceApplied PhysicsOxide ElectronicsChemical Vapor DepositionHigh-vacuum MocvdThin FilmsTio2 Thin FilmsEpitaxial GrowthSingle Molecular PrecursorThin Film Processing