Applied Physics Letters · 1998 · 209 citations · 20 references
EngineeringElectrical EngineeringMicroelectronicsSemiconductor DevicesSemiconductor MaterialsDevice ScalingField-effect TransistorsMetal-oxide-semiconductor Field-effect TransistorsNanoelectronicsOxide SemiconductorsSemiconductor Device MaterialsGate OxidesGate-dependent Current-voltage BehaviorInsulator-to-metal TransitionMetal-insulator TransitionMott Metal-insulator TransitionMott Transition
A field effect transistor fabricated with an oxide channel has been shown to demonstrate switching characteristics similar to conventional silicon metal oxide field effect transistors. This device is believed to operate via a Mott metal-insulator transition induced by the gate field, and offers a potential technology alternative for the regime beyond silicon scaling limitations.
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Masatoshi Imada, A. Fujimori, Yoshinori Tokura · Reviews of Modern Physics · 1998 · 7.5K citations
Ferroelectric Field Effect Transistor Based on Epitaxial Perovskite Heterostructures
Scott A. Mathews, R. Ramesh, T. Venkatesan et al. · Science · 1997 · 605 citations
A ferroelectric transparent thin-film transistor
M.W.J. Prins, K.-O. Grosse-Holz, Gerhard Müller et al. · Applied Physics Letters · 1996 · 196 citations · Full text
J. Mannhart · Superconductor Science and Technology · 1996 · 161 citations
Engineering, Electrical Engineering, Electronic Materials +11