Publication | Closed Access
Structure and stability of sputter deposited beta-tungsten thin films
129
Citations
14
References
1994
Year
Materials ScienceMaterials EngineeringBeta-tungsten Thin FilmsThin Tungsten FilmsCrystalline DefectsEngineeringOxygen Impurity ConcentrationOxide ElectronicsSurface ScienceApplied PhysicsCondensed Matter PhysicsX-ray DiffractionSolid-state ChemistryThin Film Process TechnologyThin FilmsChemical Vapor DepositionThin Film Processing
The structure and stability of thin tungsten films prepared by radio frequency magnetron sputter deposition have been studied by x-ray diffraction and x-ray photoelectron spectroscopy. The structure of these films has been found to systematically evolve from the metastable A15 β-W phase to the equilibrium A2 α-W phase with decreasing oxygen impurity concentration. Within the β-W phase a decrease in the concentration of incorporated oxygen results in a monotonic decrease in the lattice parameter of the unit cell until the β-W phase eventually becomes unstable, and the α-W phase is formed.
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