Concepedia

Publication | Closed Access

Plasma parameter measurements and deposition of a-Si:H thin films in pulsed ECR plasma.

DOI

14

Citations

1

References

2000

Year

N. Itagaki, A. Fukuda, Takenori Yoshizawa, Masako Shindo, Youki Ueda, Yoshinobu Kawai
Surface and Coatings Technology

References

YearCitations

Page 1