The Journal of Chemical Physics · 2013 · 73 citations · 66 references
Natural SciencesChemistryMaterials ScienceMaterials ChemistryPhysical ChemistrySurface ChemistryCrystallographyInorganic SpectroscopySurface CrystallographySurface PhysicsSurface ReactivitySurface SpectroscopyAdsorbate CharacterizationAngle-resolved X-ray Photoelectron SpectroscopyCopper ChemistryElectron TransferNear-edge X-ray Absorption Fine Structure SpectroscopySurface Adsorption SitesSurface Adsorption SpectroscopyX-ray Absorption Near Edge Structure
We report on the adsorption and self-metalation of a prototypic tetrapyrrole compound, the free-base porphine (2H-P), on the Cu(111) surface. Our multitechnique study combines scanning tunneling microscopy (STM) results with near-edge X-ray absorption fine-structure (NEXAFS) and X-ray photoelectron spectroscopy (XPS) data whose interpretation is supported by density functional theory calculations. In the first layer in contact with the copper substrate the molecules adsorb coplanar with the surface as shown by angle-resolved NEXAFS measurements. The quenching of the first resonance in the magic angle spectra of both carbon and nitrogen regions indicates a substantial electron transfer from the substrate to the LUMO of the molecule. The stepwise annealing of a bilayer of 2H-P molecules sequentially transforms the XP and NEXAFS signatures of the nitrogen regions into those indicative of the coordinated nitrogen species of the metalated copper porphine (Cu-P), i.e., we observe a temperature-induced self-metalation of the system. Pre- and post-metalation species are clearly discriminable by STM, corroborating the spectroscopic results. Similar to the free-base porphine, the Cu-P adsorbs flat in the first layer without distortion of the macrocycle. Additionally, the electron transfer from the copper surface to the molecule is preserved upon metalation. This behavior contrasts the self-metalation of tetraphenylporphyrin (2H-TPP) on Cu(111), where both the molecular conformation and the interaction with the substrate are strongly affected by the metalation process.
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