Depth profiling using C60+ SIMS—Deposition and topography development during bombardment of silicon - Concepedia

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Depth profiling using C60+ SIMS—Deposition and topography development during bombardment of silicon

84

Citations

3

References

2006

Year

Greg Gillen, James D. Batteas, Chris A. Michaels, P. Chi, John A. Small, Eric Windsor, Albert J. Fahey, Jennifer R. Verkouteren, K.J. Kim

Applied Surface Science

EngineeringApplied PhysicsSemiconductor Device FabricationTopography DevelopmentInstrumentationChemical Vapor DepositionC60+ Sims—deposition

References

	Year	Citations

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