Publication | Closed Access
Properties of TiO2 films prepared by ion-assisted deposition using a gridless end-Hall ion source
54
Citations
7
References
1996
Year
Materials ScienceEngineeringIon-assisted DepositionOxide ElectronicsTio2 FilmsApplied PhysicsThin FilmsChemical DepositionChemical Vapor DepositionThin Film Processing
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