Growth and properties of alumina films obtained by low-pressure metal–organic chemical vapor deposition

VI. The phenomena of rupture and flow in solids

Alan Arnold Griffith · Philosophical Transactions of the Royal Society of London Series A Containing Papers of a Mathematical or Physical Character · 1921 · 10.6K citations · Full text

Engineering, Materials Engineering, Materials Science +13

Effects of ionizing radiation on oxidized silicon surfaces and planar devices

E. H. Snow, Andrew S. Grove, D.J. Fitzgerald · Proceedings of the IEEE · 1967 · 314 citations

Engineering, Electrical Engineering, Materials Science +17

Deposition and Properties of Aluminum Oxide Obtained by Pyrolytic Decomposition of an Aluminum Alkoxide

J. A. Aboaf · Journal of The Electrochemical Society · 1967 · 143 citations

Natural Sciences, Materials Engineering, Materials Science +17

Aluminum oxide thin films prepared by chemical vapor deposition from aluminum 2-ethylhexanoate

Toshiro Maruyama, T. NAKAI · Applied Physics Letters · 1991 · 128 citations · Full text

Natural Sciences, Chemistry, Materials Science +17

Aluminum oxide thin films prepared by chemical vapor deposition from aluminum acetylacetonate

Toshiro Maruyama, Susumu Arai · Applied Physics Letters · 1992 · 113 citations · Full text

Natural Sciences, Materials Engineering, Materials Science +9