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Influence of substrate bias voltage on deposition behavior and micro-indentation hardness of Ti–Si–N coatings by a hybrid coating system of arc ion plating and sputtering techniques

Materials EngineeringMaterials ScienceElectrical EngineeringEngineeringSurface ScienceSubstrate Bias VoltageThin Film DevicesDeposition BehaviorThin FilmsMicro-indentation HardnessSurface ProcessingChemical Vapor DepositionThin Film Processing