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Atmospheric pressure chemical vapour deposition of tin(ii) sulfide films on glass substrates from Bun3SnO2CCF3 with hydrogen sulfide
48
Citations
11
References
2000
Year
Materials ScienceMaterials EngineeringChemical EngineeringEngineeringSurface ScienceGlass SubstratesSolid-state ChemistryApcvd ReactionThin Film Process TechnologyChemistryThin FilmsSulfide FilmsChemical DepositionVacuum DeviceHydrogen SulfideChemical Vapor DepositionThin Film Processing
In a search for a mild, rapid, moderately low temperature route to the deposition of thin films of tin(II) sulfide (SnS) on glass, we have investigated the APCVD reaction of tri-n-butyltin trifluoroacetate with hydrogen sulfide at 350–600 °C under nitrogen. The films deposited over a 15 min period were shown to be SnS by X-ray diffraction, Raman microscopy, EDAX, SEM and XPS. The conditions established are attractive for the large scale, rapid production of tin(II) sulfide films.
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