Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1985 · 78 citations · 0 references
Natural SciencesChemistryMaterials SciencePolymer ChemistryPolymer EngineeringPolymer MaterialsOptical PolymersPhotochemistryPhotochromic MaterialsPolymer Thin FilmsSoft LithographyThin Film LithographyDeep Ultraviolet LithographyPhotopolymer MaterialsPolymer PhotonicsProjection LithographySilane CouplingThin Film Resist Processing
A new class of alkyl silane copolymers with relatively facile self-developing behavior under deep UV exposure has been examined. These materials can reproduce 0.8 μ features by projection lithography with a KrF excimer light source. The mechanism of material removal is primarily photochemical in nature and yields chemically inert volatile siloxanes as the major photoproducts, via a high quantum yield silylene expulsion/oxidation process.