Deposition of TiC films by dual source dc magnetron sputtering

Mechanisms of reactive sputtering of titanium nitride and titanium carbide I: Influence of process parameters on film composition

J.‐E. Sundgren, B.-O. Johansson, Susanne Karlsson · Thin Solid Films · 1983 · 180 citations

Natural Sciences, Materials Engineering, Materials Science +17

Reactively sputtered nitrides and carbides of titanium, zirconium, and hafnium

William D. Sproul · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1986 · 91 citations

Natural Sciences, Materials Engineering, Materials Science +10

The formation and control of direct current magnetron discharges for the high-rate reactive processing of thin films

R.P. Howson, A.G. Spencer, K. Oka et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1989 · 80 citations

Natural Sciences, Materials Engineering, Materials Science +17

Deposition of titanium carbide films from mixed carbon and titanium plasma streams

Marie‐Paule Delplancke‐Ogletree, O.R. Monteiro · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1997 · 47 citations

Natural Sciences, Materials Engineering, Materials Science +17

Tribological behavior of TiN, TiCxNy and TiC coatings prepared by unbalanced magnetron sputtering techniques

Jianguo Deng, Manuel Braun · Surface and Coatings Technology · 1994 · 40 citations

Natural Sciences, Materials Engineering, Materials Science +14