Self-induced preparation of TiSi nanopins by chemical vapor deposition

Abstract

High-density single-crystalline orthorhombic TiSi nanorods and nanopins have been successfully prepared for the first time on a Ti5Si3 layer by chemical vapor deposition, using SiH4 and TiCl4 as the precursors. The quadrate nanorods are approximately 0.5 µm long and 30 nm × 30 nm in area. The nanopins are 0.7–1 µm long in total, with the quadrate tip about 200 nm long and 50 nm × 50 nm in area. The TiSi nanorods and nanopins grow along the [110] direction of the orthorhombic TiSi crystal from the bottom, with the tip being pushed upwards. The growth process can be defined as a self-induced growth. The self-induction mechanism addressed here expands our understanding of growing nanostructures.