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RF-sputtered ferroelectric barium titanate films on silicon
18
Citations
8
References
1980
Year
Materials ScienceElectrical EngineeringEngineeringFerroelectric ApplicationOxide ElectronicsApplied PhysicsFerroelectric MaterialsAbstract Polycrystalline FilmsSemiconductor MaterialThin Film Process TechnologyThin FilmsFerroelectric PropertiesSilicon SystemFunctional MaterialsThin Film Processing
Abstract Polycrystalline films of BaTi03 with ferroelectric properties are regularly observed for films thicker than 1000 Å which have been rf-sputtered deposited at 5 Å/min onto silicon substrates at temperatures above 500°C. A 2000 Å thick film deposited under these conditions typically exhibits a counter-clockwise hysteresis curve, a leakage current below 10−5 C/cm2, a remanent polarization persisting for two days, and a dielectric constant vs. temperature relationship which peaks at 135°C. The nature of the BaTi03 - silicon system has been extensively characterized by supporting studies.
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