CoCr thin films prepared by high rate magnetron sputtering

Abstract

CoCr thin films for perpendicular recording have been prepared by magnetron sputtering from 6 mm to 8 mm thick targets with deposition rates up to 12 nm/s. From hysteresis loops and x-ray diffraction patterns it was concluded that the films have a perpendicular magnetic anisotropy and a hcp-texture with c-axis normal to the film plane. The coercivity H <inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">c</inf> ( <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">\perp</tex> ) ranged from 20 kA/m to 140 kA/m.