Applied Physics Letters · 1992 · 189 citations · 8 references
EngineeringMaterials EngineeringMaterials ScienceElectronic MaterialsOptoelectronicsSemiconductor MaterialsDopingOptical Properties Of SemiconductorsQuantum OptoelectronicsRare-earth-doped MaterialsSemiconductor Crystal GrowthSemiconductor Device MaterialsCarrier ConcentrationDoped SemiconductorsMolecular Beam EpitaxyMolecular Beam Epitaxy KineticsN-type DopingTemperature DependenceTemperature Dependence Measurement
We have examined the compensation processes in nitrogen doped ZnSe grown by molecular beam epitaxy. Two independent donor–acceptor pair emission processes have been observed in photoassisted grown layers and detailed temperature dependence measurements have allowed us to conclude that a deep compensation donor with a binding energy of 44 meV exists in more heavily doped material. We propose that the compensating donor is a complex involving a native defect such as the (VSe-Zn-NSe) single donor and this suggestion is supported by the observation of changes in the carrier concentration profile with time.
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M. A. Haase, Jun Qiu, J. M. DePuydt et al. · Applied Physics Letters · 1991 · 1.6K citations
Heavily doped <i>p</i>-ZnSe:N grown by molecular beam epitaxy
Jun Qiu, J. M. DePuydt, Hai‐Ping Cheng et al. · Applied Physics Letters · 1991 · 294 citations