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Compensation processes in nitrogen doped ZnSe
189
Citations
8
References
1992
Year
SemiconductorsIi-vi SemiconductorEngineeringDeep Compensation DonorPhysicsOxide ElectronicsExperimental AnalysisNative DefectApplied PhysicsOptoelectronic DevicesAmmoniaMolecular Beam EpitaxyCompound SemiconductorSemiconductor Nanostructures
We have examined the compensation processes in nitrogen doped ZnSe grown by molecular beam epitaxy. Two independent donor–acceptor pair emission processes have been observed in photoassisted grown layers and detailed temperature dependence measurements have allowed us to conclude that a deep compensation donor with a binding energy of 44 meV exists in more heavily doped material. We propose that the compensating donor is a complex involving a native defect such as the (VSe-Zn-NSe) single donor and this suggestion is supported by the observation of changes in the carrier concentration profile with time.
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