Publication | Closed Access
Low pressure chemical vapor deposition (LPCVD) of β–SiC on Si(100) using MTS in a hot wall reactor
39
Citations
31
References
1993
Year
Materials EngineeringMaterials ScienceHot Wall ReactorEngineeringApplied PhysicsSemiconductor Device FabricationChemical Vapor DepositionCarbide
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