Publication | Open Access
Refractive index and extinction coefficient dependence of thin Al and Ir films on deposition technique and thickness
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2007
Year
Optical MaterialsEngineeringThin Film Process TechnologyChemical DepositionThin AlOptical PropertiesPulsed Laser DepositionReflectanceThin Film ProcessingIr FilmsMaterials SciencePhysicsLight MetalDeposition TechniqueRefractive IndexDepth-graded Multilayer CoatingThin Metallic FilmsSurface ScienceApplied PhysicsThin FilmsOptoelectronicsChemical Vapor Deposition
We show that the optical properties of thin metallic films depend on the thickness of the film as well as on the deposition technique. Several thicknesses of electron-beam-gun-evaporated aluminium films were measured and the refractive index and the extinction coefficient defined using ellipsometry. In addition, the refractive indexes and the extinction coefficients of atomic-layer-deposited iridium were compared with those of evaporated iridium samples.