The influence of hydrogen gas on the characteristics of amorphous silicon deposited by RF sputtering - Concepedia

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The influence of hydrogen gas on the characteristics of amorphous silicon deposited by RF sputtering

18

Citations

9

References

1982

Year

J.T. Lue, O. Meyer, J.C. Lombaard, R.H. Wang

Solid-State Electronics

Materials EngineeringMaterials ScienceElectrical EngineeringEngineeringSurface ScienceApplied PhysicsAmorphous SiliconSemiconductor Device FabricationAmorphous SolidSilicon On InsulatorMicroelectronicsHydrogen GasThin Film Processing

References

	Year	Citations

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