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Growth and characterization of Sr-doped Cu<sub>2</sub>O thin films deposited by metalorganic chemical vapor deposition
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Citations
42
References
2015
Year
Materials ScienceCopper Oxide MaterialsEngineeringOxide ElectronicsSurface ScienceApplied PhysicsFilm Strontium ContentLarger Strontium ContentsStrontium ConcentrationThin Film Process TechnologyThin FilmsChemical DepositionEpitaxial GrowthChemical Vapor DepositionThin Film Processing
Strontium-doped Cu2O thin films were successfully grown through metalorganic chemical vapor deposition method. The films were characterized regarding their morphology, composition, electrical, and optical properties. The composition of the films, and especially their strontium concentration, is the dominant factor which mainly affects the morphology as well as the electrical film properties. Indeed, it was observed that an increase of the film strontium content decreases its resistivity, from 105 Ω cm for undoped Cu2O films to about 101 Ω cm for films doped with 5–6% strontium without any impact on their optical properties. However, for larger strontium contents, the Cu2O films also contain SrCO3 as impurity phase.
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