High-reflectivity HfO_2/SiO_2 ultraviolet mirrors

TLDR

Thin‑film HfO₂/SiO₂ layers and UV mirrors were deposited by ion plating and plasma ion‑assisted deposition, followed by optical characterization. The resulting dense multilayer HfO₂/SiO₂ mirrors achieved approximately 99 % reflectance near 250 nm, with measured optical constants presented.

Abstract

High-reflectivity dense multilayer coatings were produced for the ultraviolet spectral region. Thin-film single layers and UV mirrors were deposited by ion plating and plasma ion-assisted deposition high-energetic technologies. Optical characterizations of HfO2 and SiO2 single layers are made. The optical constants obtained for these two materials are presented. HfO2 and SiO2 mirrors with a reflectance of approximately 99% near 250 nm are reported.