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Leakage current behavior in lead-free ferroelectric (K,Na)NbO3-LiTaO3-LiSbO3 thin films
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References
2010
Year
Materials ScienceOxide HeterostructuresElectrical EngineeringLeakage Current BehaviorEngineeringFerroelectric ApplicationOxide ElectronicsApplied PhysicsConduction MechanismsSemiconductor MaterialThin Film Process TechnologyThin FilmsSuch Thin FilmsEpitaxial GrowthThin Film Processing
Conduction mechanisms in epitaxial (001)-oriented pure and 1 mol % Mn-doped (K0.44,Na0.52,Li0.04)(Nb0.84,Ta0.1,Sb0.06)O3 (KNN-LT-LS) thin films on SrTiO3 substrate were investigated. Temperature dependence of leakage current density was measured as a function of applied electric field in the range of 200–380 K. It was shown that the different transport mechanisms dominate in pure and Mn-doped thin films. In pure (KNN-LT-LS) thin films, Poole-Frenkel emission was found to be responsible for the leakage, while Schottky emission was the dominant mechanism in Mn-doped thin films at higher electric fields. This is a remarkable yet clear indication of effect of 1 mol % Mn on the resistive behavior of such thin films.
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