One/two-photon-sensitive photoacid generators based on benzene oligomer-containing D–π–A-type aryl dialkylsulfonium salts

Abstract

D–π–A type photoacid generators with a benzene-oligomer as π-conjugated systems show high photoacid generation efficiency (<italic>Φ</italic>_H+max &gt; 0.7) and good photoinitiated polymerization abilities by 365 nm and 780 nm excitation.