Progress in up-scaling of thin film silicon solar cells by large-area PECVD KAI systems

Abstract

UNAXIS KAI PECVD reactors developed for AM LCD technology have been demonstrated to possess a high potential for thin film silicon solar cells based on amorphous and microcrystalline silicon. For the next generation of thin film modules with highly effective light-trapping LP-CVD ZnO large-area deposition is developed at Unaxis as well, in combination with a very simple but effective back reflector concept. A first prototype module of 0.447 m/sup 2/ active area with 7.1% initial efficiency has been achieved for amorphous silicon. Micromorph mini-modules were prepared with 9.3% initial aperture efficiency. All important module fabrication steps are under development at Unaxis for a complete line concept.