Publication | Closed Access
Temperature-dependent leakage mechanisms of Pt∕BiFeO3∕SrRuO3 thin film capacitors
207
Citations
22
References
2007
Year
EngineeringPositive BiasesSemiconductor DevicePt/bfo/sro CapacitorFerroelectric ApplicationNanoelectronicsSuperconductivityElectronic PackagingMolecular Beam EpitaxyEpitaxial GrowthThin Film ProcessingMaterials ScienceElectrical EngineeringOxide ElectronicsDominant Leakage MechanismTemperature-dependent Leakage MechanismsMicroelectronicsStress-induced Leakage CurrentApplied PhysicsThin Films
Epitaxial c-axis oriented BiFeO3 (BFO) thin films were deposited on conductive SrRuO3 (SRO) on (001) SrTiO3 substrates by pulsed laser deposition. A Pt/BFO/SRO capacitor was constructed by depositing a top Pt electrode. The leakage current density versus. electric field characteristics were investigated from 80to350K. It was found that the leakage mechanisms were a strong function of temperature and voltage polarity. At temperatures between 80 and 150K, space-charge-limited current was the dominant leakage mechanism for both negative and positive biases. On the other hand, at temperatures between 200 and 350K the dominant leakage mechanisms were Poole-Frenkle emission and Fowler-Nordheim tunneling for negative and positive biases, respectively.
| Year | Citations | |
|---|---|---|
Page 1
Page 1