Applied Physics Letters · 2007 · 210 citations · 22 references
Natural SciencesElectrical EngineeringMaterials ScienceElectronic MaterialsMicroelectronicsThin FilmsElectrode MaterialsFerroelectric CeramicsFerroelectric MaterialsThin Film Electrical PropertiesBiasesCapacitorsCurrent DensityFowler-nordheim TunnelingLeakageLeakage CurrentLeakage MechanismsPulsed Laser Deposition
Epitaxial c-axis oriented BiFeO3 (BFO) thin films were deposited on conductive SrRuO3 (SRO) on (001) SrTiO3 substrates by pulsed laser deposition. A Pt/BFO/SRO capacitor was constructed by depositing a top Pt electrode. The leakage current density versus. electric field characteristics were investigated from 80to350K. It was found that the leakage mechanisms were a strong function of temperature and voltage polarity. At temperatures between 80 and 150K, space-charge-limited current was the dominant leakage mechanism for both negative and positive biases. On the other hand, at temperatures between 200 and 350K the dominant leakage mechanisms were Poole-Frenkle emission and Fowler-Nordheim tunneling for negative and positive biases, respectively.
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