Japanese Journal of Applied Physics · 2005 · 58 citations · 11 references
Natural SciencesMaterials EngineeringMaterials ScienceCrystal StructureElectronic MaterialsThin FilmsChemical Vapor DepositionEpitaxial GrowthThin Film Electrical PropertiesThin Film Magnetic PropertiesThin-film MaterialsElectrical PropertiesEpitaxial Film GrowthEpitaxial Thin-film GrowthFilm ThicknessHysteresisHysteresis LoopsMetalorganic Chemical Vapor DepositionX-ray Diffraction Analysis
BiFeO 3 thin films with various thicknesses were grown on (100) c SrRuO 3 ∥(100)SrTiO 3 substrates at 620°C by metalorganic chemical vapor deposition (MOCVD) for the first time. X-ray diffraction analysis revealed cube-on-cube epitaxial growth of phase-pure BiFeO 3 films with (001) orientation irrespective of the film thickness. Out-of-plane lattice parameter decreased with increasing the film thickness up to 100 nm, however this change with the film thickness became small above this thickness. The well saturated hysteresis loops with the remanent polarization and the coercive field values of 51 µC/cm 2 and 166 kV/cm, respectively were obtained at 80 K up to 400 kV/cm for the 480-nm-thick film.
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Epitaxial BiFeO <sub>3</sub> Multiferroic Thin Film Heterostructures
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Comment on "Epitaxial BiFeO <sub>3</sub> Multiferroic Thin Film Heterostructures"
W. Eerenstein, Finlay D. Morrison, Joonghoe Dho et al. · Science · 2005 · 568 citations