Publication | Closed Access
Epitaxial growth of non-<i>c</i>-oriented SrBi2Nb2O9 on (111) SrTiO3
74
Citations
17
References
2000
Year
Oxide HeterostructuresMaterials ScienceSemiconductorsOptical MaterialsElectrical EngineeringSrbi2nb2o9 FilmsSrtio3 SubstratesEngineeringFerroelectric ApplicationX-ray DiffractionApplied PhysicsCondensed Matter PhysicsThin Film Process TechnologyThin FilmsMolecular Beam EpitaxyEpitaxial GrowthThin Film Processing
Epitaxial SrBi2Nb2O9 thin films have been grown with a (103) orientation on (111) SrTiO3 substrates by pulsed-laser deposition. Four-circle x-ray diffraction and transmission electron microscopy reveal nearly phase-pure epitaxial films. Epitaxial (111) SrRuO3 electrodes enabled the electrical properties of these (103)-oriented SrBi2Nb2O9 films to be measured. The low-field relative permittivity was 185, the remanent polarization was 15.7 μC/cm2, and the dielectric loss was 2.5% for a 0.5-μm-thick film.
| Year | Citations | |
|---|---|---|
Page 1
Page 1