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Epitaxial colossal magnetoresistive La0.67(Sr,Ca)0.33MnO3 films on Si
80
Citations
9
References
2003
Year
Materials ScienceMagnetismMaterials EngineeringOxide HeterostructuresEngineeringPhysicsOxide ElectronicsX-ray DiffractionApplied PhysicsLa 0.67Semiconductor MaterialThin FilmsPulsed Laser DepositionEpitaxial GrowthMagnetoresistanceLscmo Layer Grows
La 0.67 ( Sr,Ca ) 0.33 MnO 3 (LSCMO) films have been grown by a pulsed-laser deposition technique on Si(001) substrates buffered with Bi4Ti3O12/CeO2/yttrium-stabilized zirconia (YSZ) heteroepitaxial layers. X-ray diffraction has revealed cube-on-cube growth of an epitaxial Bi4Ti3O12/CeO2/YSZ/Si heterostructure whereas the LSCMO layer grows in the “diagonal-on-side” manner on top of the Bi4Ti3O12 (BTO) template. The maximum temperature coefficient of resistivity (TCR)=4.4% K−1 and colossal magnetoresistance (CMR) Δρ/ρ∼2.9% kOe−1 have been reached at 294 K. This was achieved due to the successive improvement of c-axis orientation of the layers: Full widths at half-maximum 0.65°, 0.58°, 0.65°, 1.13°, and 0.18° in LSCMO/BTO/CeO2/YSZ/Si stack, respectively. As a prototype of an uncooled bolometer, heteroepitaxial CMR structure on Si demonstrates, at 294 K, the noise equivalent temperature difference of 1.2 μK/√Hz@30 Hz.
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