Publication | Closed Access
Fe 3 O 4 and its magnetic tunneling junctions grown by ion beam deposition
45
Citations
5
References
2003
Year
Magnetic PropertiesEngineeringMagnetic MaterialsMagnetoresistanceMagnetismFe3o4 Bottom ElectrodeIon ImplantationTunneling MicroscopyV/ru/fe3o4 SamplesMaterials ScienceOxide HeterostructuresPhysicsFe3o4 FilmsMagnetoelasticityO 4Magnetic Tunneling JunctionsFe 3Magnetic MaterialFerromagnetismNatural SciencesApplied PhysicsThin FilmsMagnetic DeviceFunctional Materials
Magnetic properties of Fe3O4 and magnetic tunnel junctions with Fe3O4 bottom electrode have been investigated. Highly conductive V/Ru layers were used as an underlayer of the Fe3O4 films. The V/Ru/Fe3O4 on [110] out-of-plane oriented MgO single crystal substrate show an anisotropy and high squareness along [11̄0] direction, while the Fe3O4 films with an underlayer of just Ru show isotropic behavior and low squareness. X-ray diffraction shows tensile stress on Fe3O4 for V/Ru/Fe3O4 samples. The anisotropy was shown to be induced by the stress. Finally, magnetic tunnel junction stacks of MgO/V/Ru/Fe3O4/AlO/CoFe/NiFe/Ru were deposited and the magnetic tunnel junctions with a junction size ranging from 2×2 μm2 to 9×9 μm2 were fabricated by optical lithography. The junctions show magnetoresistance ratios of ∼14% and no geometrical effect due to the junction size.
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