Publication | Open Access
A Point Defect Model for Anodic Passive Films: II . Chemical Breakdown and Pit Initiation
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1981
Year
EngineeringDefect ToleranceAnodizingChemical EngineeringDamage MechanismHalide ConcentrationSolidificationThin Film ProcessingPit InitiationMaterials ScienceMaterials EngineeringCrystalline DefectsTime-dependent Dielectric BreakdownDefect FormationChemical BreakdownPoint Defect ModelPhysic Of FailureSurface ScienceApplied PhysicsBreakdown PotentialThin FilmsChemical Kinetics
The point defect model that was previously developed (1) to explain the growth kinetics of a passive film has been extended to account for chemical breakdown. This model provides quantitative explanations of the dependence of breakdown potential on halide concentration, and of the incubation time‐breakdown overpotential relationships that have been observed for iron and nickel in aqueous solutions. Limitations of the model are identified and discussed.