Optical band gap of BiFeO3 grown by molecular-beam epitaxy

Jon F. Ihlefeld, Nikolas J. Podraza, Zi‐Kui Liu, Xiaoshan Xu, T. Heeg, Y. B. Chen, J. Li, R. W. Collins, J. L. Musfeldt, Xiaoqing Pan,

Applied Physics Letters · 2008 · 379 citations · 27 references

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Abstract

Bi Fe O 3 thin films have been deposited on (001) SrTiO3 substrates by adsorption-controlled reactive molecular-beam epitaxy. For a given bismuth overpressure and oxygen activity, single-phase BiFeO3 films can be grown over a range of deposition temperatures in accordance with thermodynamic calculations. Four-circle x-ray diffraction reveals phase-pure, epitaxial films with ω rocking curve full width at half maximum values as narrow as 29arcsec (0.008°). Multiple-angle spectroscopic ellipsometry reveals a direct optical band gap at 2.74eV for stoichiometric as well as 5% bismuth-deficient single-phase BiFeO3 films.

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