Low Pressure CVD of Electrochromic WO₃at 400°C

Abstract

Monoclinic tungsten trioxide coatings were deposited on fluorine doped tin dioxide glass substrate using a low pressure chemical vapor deposition system at 400°C. Morphology analysis indicated the agglomeration of grains for 50 sccm O2 flow rate, while for higher flow rates, the growth of islands which tend to coalescence to form a continuous film is observed. The electrochemical performance for the as-grown coating using 75 sccm O2 flow rate was similar with the one for 100 sccm presenting stability up to 500 scans. The samples indicated Li+ intercalated charge of 16 mC cm−2, time response of 43 s and a coloration efficiency of 38 cm−2 C−1.